CM-T70适用于半导体材料如硅片,蓝宝石,锗片,砷化镓,碳化硅,铌酸锂,钽酸锂,光学玻璃,特殊物体等的研磨抛光加工过程。
CM-T70 can applied to the grinding and polishing process of semiconductor material such as silicon wafer, sapphire, germanium wafers, GaAs, SiC, LiTaO3, LiNbO3 and other oxid crystal.
项目 Item CM-T70
软化点 softening point (℃) >70
粘结强度 Adhensive strenght(N/mm2) 6.0
比重 Specific gravity (25℃) 1.03±0.02
针入度 Needle penetration (200g/60s) 10
包装 package 20g, 100g |
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